| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition method which improves the efficiency of a vapor deposition step, reduces influence to the material such as contamination/moisture-absorption and improves a refining yield in a sublimation step, by eliminating a step of filling/charging a powder material in the vapor deposition step and making only attachment and detachment of a component necessary instead. SOLUTION: The vapor deposition method has at least the sublimation step for sublimating the sublimating material and the vapor deposition step for vapor-depositing the sublimated material on a substrate, wherein the sublimation step is the step of making the sublimated material deposit on the inner part of a multistage and inside-communicating sampling component 12 which is connected with an unsublimated-material-accommodating component 13 for accommodating the sublimating material before sublimation, and the vapor deposition step is a step of forming a film of the sublimated material on the substrate by heating one part of the sampling component 12 having the sublimated material deposited on its inner part, while using the sampling component of the state as an evaporation source. COPYRIGHT: (C)2006,JPO&NCIPI
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