发明名称 TARGET FOR MANUFACTURING RADIOISOTOPE
摘要 PROBLEM TO BE SOLVED: To provide a target for manufacturing a radioisotope raising the manufacturing efficiency of the radioisotope by restraining the target from being spattered by accelerated particles and efficiently cooling a target material. SOLUTION: The target 3 comprises a target body 31 having a storage section 34 for storing target water as the target material and a target coating 32 coating the surface of the storage section 34. The sputtering yield of the target coating 32 due to the accelerated particles is smaller than the sputtering yield of the target body 31 due to the accelerated particles. The thermal conductivity of the target body 31 is larger than that of the target coating 32. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006133138(A) 申请公布日期 2006.05.25
申请号 JP20040324197 申请日期 2004.11.08
申请人 SUMITOMO HEAVY IND LTD 发明人 ISHIZUKA TORU
分类号 G21G1/10;G21K5/08;H05H6/00 主分类号 G21G1/10
代理机构 代理人
主权项
地址