发明名称 Multi-bit non-volatile memory device, method of operating the same, and method of fabricating the same
摘要 A multi-bit non-volatile memory device and methods of operating and fabricating the same may be provided. The memory device may include a channel region formed in a semiconductor substrate, and a source and drain that form a Schottky contact with the channel region. Also, a central gate electrode may be located on a portion of the channel region, and first and second sidewall gate electrodes may be formed on the channel region along the outer sides of the central gate electrode. First and second storage nodes may be formed between the channel region and the sidewall gate electrodes.
申请公布号 US2006108629(A1) 申请公布日期 2006.05.25
申请号 US20050220619 申请日期 2005.09.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHAE SOO-DOO;KIM MOON-KYUNG;LEE JO-WON;KIM CHUNG-WOO
分类号 H01L29/788 主分类号 H01L29/788
代理机构 代理人
主权项
地址