发明名称 METHOD AND DEVICE FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a device which prevents damage from being given to a film formed on a substrate, and fine patterns on the substrate, and the device from being broken by static electricity, when supplying a treating solution containing fine ice particles onto the surface of the substrate, for treating the substrate. SOLUTION: This device comprises a means for supporting the substrate W, a nozzle 12 supplying the treating solution to the main surface of the substrate W, and a pipe 16 which is connected to the nozzle 12 and feeds the treating solution in which carbon dioxide dissolved and fine ice particles are contained, to the nozzle 12. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006130360(A) 申请公布日期 2006.05.25
申请号 JP20040318792 申请日期 2004.11.02
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YAMAMOTO SATOSHI
分类号 B08B7/00;B08B1/02;B08B3/02;B08B3/10 主分类号 B08B7/00
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