发明名称 SUBSTRATE TREATMENT DEVICE AND FLAT FLOWING TYPE SUBSTRATE TRANSPORT DEVICE
摘要 PROBLEM TO BE SOLVED: To improve treatment efficiency and treatment quality by quickly washing away unnecessary liquid from a substrate on the way of the horizontal transportation of substrates to be treated in a flat flowing system. SOLUTION: In this washing process unit 24, rollers 112 inclined at certain angles are arranged at constant pitches to structure an inclined transport passage 114, and ultraviolet rays ozone washing, scrubbing washing, rinse and drying are performed in order to an inclined substrate G moving on the inclined transport passage 114 by an ultraviolet rays lamp 122, a roll brush 130, a rinse nozzle 134 and an air knife 136 or the like. When performing scrubbing washing and rinse, foreign materials and liquid are quickly washed away from the inclined substrate G by gravity. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006131389(A) 申请公布日期 2006.05.25
申请号 JP20040324731 申请日期 2004.11.09
申请人 TOKYO ELECTRON LTD 发明人 NISHIMURA NORIHIKO;SAKAI MITSUHIRO
分类号 B65G49/06;B08B3/02;B65G49/07;G02F1/13;G02F1/1333;H01L21/027;H01L21/304;H01L21/677 主分类号 B65G49/06
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