发明名称 |
METHOD TO REMOVE THINGS DEPOSITED IN OPTICAL ELEMENTS, METHOD TO PROTECT OPTICAL ELEMENTS, DEVICE MANUFACTURING METHOD, APPARATUS CONTAINING OPTICAL ELEMENTS, AND LITHOGRAPHY APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method to remove things deposited in optical elements in an apparatus containing optical elements, and a method to protect optical elements in the apparatus. <P>SOLUTION: The method to remove things deposited in an optical device in an apparatus containing optical elements comprises supply of H<SB>2</SB>content gas to at least part of the apparatus, generation of hydrogen radicals from H<SB>2</SB>of the H<SB>2</SB>content gas, and removal of at least part of the deposits by making optical elements having deposits contact at least part of the hydrogen radicals. In addition, the method to protect optical elements comprises supply of a cap layer to the optical elements in a depositing process and removal of at least part of the cap layer from the optical elements in the foregoing removal process when the apparatus is being used or after it is used. This method is applicable to the lithography apparatus. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006135307(A) |
申请公布日期 |
2006.05.25 |
申请号 |
JP20050289648 |
申请日期 |
2005.10.03 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;VADIM YEVGENYEVICH BANINE;MOORS JOHANNES HUBERTUS JOSEPHINA;SPEE CAROLUS IDA MARIA ANTONIUS;KLUNDER DERK JAN W;ZALM PETER CORNELIS |
分类号 |
H01L21/027;G02B1/10;G02B5/26;G21K1/06 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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