| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus, and to provide a method of manufacturing device. <P>SOLUTION: A lithographic apparatus comprises an illumination system for providing a projection radiation beam, a support structure for supporting a patterned device that functions to give a pattern on the sectional face of the projection beam, a substrate table for holding a substrate, and a projector for projecting a patterned beam on the target of the substrate. A sensor is provided for measuring spatial intensity distribution of the projection beam in the substrate. The spatial distribution of the transmittance or the reflectance of the patterned device can be determined from a measured intensity distribution with the distribution of the projection beam incident on the patterned device. By comparing the transmittance or reflectance of a region having completely the same pattern, integrated (microscopic) distribution of the transmittance or the reflectance of the patterned device can be determined. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
