| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus for attenuating a strength of undesirable radiation in a radiation beam in an optical system, and to provide a device manufacturing method. <P>SOLUTION: A lithographic apparatus comprises an illumination system configured to transmit the radiation beam which includes a desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wavelength or another wavelength range; a support structure configured to support a patterning structure in which a pattern is imparted to the cross section of the radiation beam; a substrate table configured to hold a substrate; and a projection system configured to project the pattern imparted radiation beam on the target of the substrate, wherein in the case of use at least part of the lithographic apparatus includes a gas substantially transmissive for at least part of the desired radiation and substantially less transmissive for at least part of the undesired radiation. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
