| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device and a method for controlling an exposure amount capable of not only equalizing an integrated exposure amount but also improving the degree of freedom of a control for the integrated exposure amount, and to provide a manufacturing method for the device using the exposure device or the method for controlling the exposure amount. <P>SOLUTION: The exposure device is constituted while containing an excimer laser-beam source 1 and an exposure body. In the exposure device, an exposure controller 23 mounted on the exposure body outputs an energy target value indicating the energy of laser beams LB emitted from the excimer laser-beam source 1 to the excimer laser-beam source 1 on the basis of the result of the detection of an integrator sensor 22. The exposure controller 23 outputs the energy target values at every pulse of laser beams LB emitted from the excimer laser-beam source 1 and controls the energies of laser beams LB at every pulse. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
