| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a sputter ion pump having a baking treatment mechanism which will not induce demagnetization, demagnetization, and leakage of magnetic lines of force or the like, and retains the intended magnetic field strength. <P>SOLUTION: The ion pump 1 comprises a pump cell 2b, constituted of an anode 7 and a pair of cathodes 6a, 6b in the inside of a pump case 2 and is installed with a pair of magnetets 8a, 8b in a direction facing both the cathodes 6a, 6b and a yoke 4 surrounding these magnets 8a, 8b on the outside of the pump case 2. A heating heater 9 of plate shape is installed at the side face portion of the pump cell 2b, from the outside of the pump case 2. Further, separate heating heaters 3a, 3b are installed from the outside of the pump case located in the space portion 2a. Furthermore, the pump case 2, installed with the magnets 8a, 8b, the yoke 4, and the heating heaters 9, 3a, 3b, is housed in a heat insulating box 11, and at that time, the contact portion between the pump case 2 and the heat insulating box 11 is limited to be only a fixing screw 12 of non-magnetism material quality. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
