发明名称 Multivariate control of semiconductor processes
摘要 A method for detecting a fault condition of a manufacturing process involving acquiring data and developing a model based on a plurality of manufacturing related variables for a plurality of outputs of a manufacturing process. The method also involves identifying which of the manufacturing related variables have a substantial affect on the model for detecting faulty outputs of the manufacturing process. The method also involves updating the model by using the manufacturing related variables identified as having a substantial affect on the model to improve the ability of the model to detect faulty outputs of the manufacturing process.
申请公布号 US2006111804(A1) 申请公布日期 2006.05.25
申请号 US20050229153 申请日期 2005.09.16
申请人 MKS, INSTRUMENTS, INC. 发明人 LIN KUO-CHIN
分类号 G06F19/00 主分类号 G06F19/00
代理机构 代理人
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