发明名称 METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a transparent conductive film showing a stable ohmic value, by appropriately evaluating film resistance. SOLUTION: The method for producing the transparent conductive film on a substrate comprises the steps of: measuring a film thickness of the transparent conductive film formed in a film production chamber 3; simultaneously measuring the ohmic value of the transparent conductive film formed in a subsequent evaluation chamber 4; and feeding a measured result of film thickness and the ohmic value back to a film production condition in the film production chamber 3 to form the transparent conductive film. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006131955(A) 申请公布日期 2006.05.25
申请号 JP20040322131 申请日期 2004.11.05
申请人 FUJI ELECTRIC HOLDINGS CO LTD 发明人 WADA KATSUHITO
分类号 C23C14/08;H01B13/00 主分类号 C23C14/08
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