发明名称 STRESSED SEMICONDUCTOR-ON-INSULATOR STRUCTURE RESISTANT TO HIGH-TEMPERATURE STRESS
摘要 The invention relates to a semiconductor- on-insulator structure, comprising a part which is made of a semiconductor material and a part which is made of an electrically insulating material, said materials being coupled to each other. Elastic stress is present in the semiconductor material. The part made of electrically insulating material has a viscosity temperatureTG which is higher than the viscosity temperature TG SiO2 of SiO 2. The invention also relates to a method for the production of said semiconductor-on-insulator structure.
申请公布号 KR20060056955(A) 申请公布日期 2006.05.25
申请号 KR20067001759 申请日期 2006.01.25
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 GHYSELEN BRUNO;AULNETTE CECILE;RAYSSAC OLIVIER
分类号 H01L27/12;H01L21/762 主分类号 H01L27/12
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