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发明名称
Photoresist monomer containing imide and polymer thereof
摘要
申请公布号
KR100583093(B1)
申请公布日期
2006.05.24
申请号
KR20000081774
申请日期
2000.12.26
申请人
发明人
分类号
G03F7/004
主分类号
G03F7/004
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代理人
主权项
地址
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