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发明名称
CONTACT STRUCTURE AND METHOD FOR FORMING CONTACT HOLE IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20060055754(A)
申请公布日期
2006.05.24
申请号
KR20040094900
申请日期
2004.11.19
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
PARK, JEONG JU;HWANG, JUNG HYUN
分类号
H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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