Method and apparatus for removing particles from a surface of an article

摘要

A method and an apparatus for removing particles from a surface of an article, such as a semiconductor wafer in a clean room, are disclosed. The particles are supplied with an electric charge. Subsequently, an ultrasonic wave or a gas stream is applied onto the surface of the article while an electric field is applied for driving away the electrically charged particles from the surface, thereby removing particles having a dimension smaller than 1 micrometer from the surface. The presence of a collecting member allows the removal of resulting, floating particles.