Substrate tempering device e.g. hotplate, cleaning device, has cleaning unit for cleaning substrate-tempering device and turbine vane for producing rotational relative motion between cleaning unit and substrate tempering device

摘要

The device has a cleaning unit (1) for cleaning a substrate-tempering device (10) and a turbine vane (2) for producing a rotational relative motion between the cleaning unit and the substrate tempering device. A gas flow (3) is tangentially and/or axially made on the turbine vane and produced by a low pressure in an outlet (5) of the device. A rotor of an electrical motor is coupled with the cleaning unit. An independent claim is also included for a method for cleaning a tempering device.