发明名称 Liquid-phase growth process and liquid-phase growth apparatus
摘要 A liquid-phase growth process for continuously growing a crystal film on a plurality of substrates with respect to their one side surfaces, characterized in that said plurality of substrates are kept afloat on the surface of a flowing solution for liquid-phase epitaxy which comprises a crystallizing material dissolved in a solvent in a supersaturated state and which is flowing in a solution flow passage, and while said plurality of substrates being moved by virtue of said flowing solution in said solution flow passage, a crystal film is grown on the surfaces of said plurality of substrates which are in contact with said flowing solution. A liquid-phase growth apparatus suitable for practicing said liquid-phase growth process.
申请公布号 US7048797(B2) 申请公布日期 2006.05.23
申请号 US20030665075 申请日期 2003.09.22
申请人 CANON KABUSHIKI KAISHA 发明人 MIZUTANI MASAKI;YOSHINO TAKEHIKO;NISHIDA SHOJI
分类号 C30B19/00;C30B19/06;C30B19/02;H01L21/208 主分类号 C30B19/00
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