| 摘要 |
Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure (I), where R1 is a moiety containing an ethylenically unsaturated polymerizable group, R2 is a Cl-C3 alkylene group, and R3 is a C1-10 linear or cyclic alkyl group, a C6-10 aromatic or substituted aromatic group, a C1-8 alkoxy methyl, or a C1-8 alkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.
|
