| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inorganic material membrane, an inorganic material membrane structure, and its manufacturing method with a low dielectric constant and a highly accurate and fine structure, and also to provide a transfer film easy to manufacture, having a composition suitably adhering to a substrate and a photosensitive resist. <P>SOLUTION: The porous inorganic material membrane is obtained by firing a non-photosensitive composition containing at least inorganic powder. The inorganic material membrane has 20-65% void surface area ratio and 5-20 μm void size. The method of manufacturing the inorganic material membrane structure provides the non-photosensitive composition on a substrate, provides a photosensitive composition on the non-photosensitive composition, then exposes and develops, and forms a pattern on the non-photosensitive composition, and fires. The transfer film includes a coated layer comprising the non-photosensitive composition on a flexible tentative support. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
