SUBSTRATE PROCESSING APPARATUS

摘要

To reduce the load on workers while preventing lowering of the precision of the detection of an object. A substrate processing apparatus is provided with a light projecting part 450a and a light receiving part 450b which constitute a detection sensor 450. The light receiving part 450b is shifted in the (+Z) direction from a position where laser beam emitted from the light projecting part 450a is received and arranged at a position where the reflection light reflected by the object is received. In the substrate processing apparatus, when the light receiving part 450b receives the laser beam, it is judged that the object is existed and a movement mechanism of a slit nozzle is controlled.