| 发明名称 |
COMPOSITION FOR REMOVING PHOTORESIST AND/OR ETCHING RESIDUE FROM A SUBSTRATE AND USE THEREOF |
| 摘要 |
<p>Compositions containing certain organic solvents comprising at least 50% by weight of a glycol ether and a quaternary ammonium compound are capable of removing residues such as photoresist and/or etching residue from an article.</p> |
| 申请公布号 |
KR20060053853(A) |
申请公布日期 |
2006.05.22 |
| 申请号 |
KR20050064750 |
申请日期 |
2005.07.18 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
EGBE MATTHEW I.;JENNINGS DENISE GEITZ |
| 分类号 |
G03F7/42;G03F7/26;G03F7/40 |
主分类号 |
G03F7/42 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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