| 摘要 |
FIELD: technology for production of quantum size structures on basis of amorphous silicon nano-clusters, built into dielectric matrix, by means of decomposition of silicon containing gas mixture, possible use in solid body electronics. ^ SUBSTANCE: method for producing quantum size structures on basis of amorphous silicon nano-clusters, built into dielectric matrix, is realized by decomposing a mixture of mono-silane and source of nitrogen in plasma of glow discharge with generation of reaction products and sedimentation from them of quantum size structures based on amorphous silicon nano-clusters. During decomposition and sedimentation, plasma of glow discharge is used with frequency of 45-65 kHz, and as nitrogen source ammonia is used. ^ EFFECT: increased speed of growth of quantum sized structures on basis of silicon nano-clusters, built into dielectric matrix, while preserving their tool qualities. ^ 1 tbl |
