发明名称 |
ANTI-REFLECTIVE FILM, COATING COMPOSITION FOR FORMING ANTI-REFLECTIVE FILM, AND ARTICLE HAVING ANTI-REFLECTIVE FILM |
摘要 |
<p>An antireflective coating having improved alkali resistance is formed on a transparent substrate of synthetic resin as an outermost layer and has a three-dimensional crosslinked structure containing F and Si atoms. The crosslinked structure is composed of Si-O-Si and Si-C<SUB>2</SUB>H<SUB>4</SUB>-(CF<SUB>2</SUB>)<SUB>n</SUB>-C<SUB>2</SUB>H<SUB>4</SUB>-Si linkages wherein n is 4 or 6; the molar ratio of F atoms to Si atoms is from 8.0 to 10.0; and perfluoroalkyl groups account for 90 to 100 mol % of all monovalent organic substituent groups attached to silicon atoms. The antireflective coating can exhibit such alkali resistance that when a droplet of a 1 wt % NaOH aqueous solution is rested on the antireflective coating for 30 minutes and then wiped off, the appearance of the coating is kept unchanged from the initial appearance.</p> |
申请公布号 |
KR20060052205(A) |
申请公布日期 |
2006.05.19 |
申请号 |
KR20050095901 |
申请日期 |
2005.10.12 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
YAMAYA MASAAKI;SATO KAZUHARU |
分类号 |
G02B1/11;(IPC1-7):G02B1111 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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