RINSE AND RESIST PATTERNING PROCESS USING THE SAME,申请号KR20050054778-传众专利搜索

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发明名称	RINSE AND RESIST PATTERNING PROCESS USING THE SAME
摘要
申请公布号	KR20060049679(A)	申请公布日期	2006.05.19
申请号	KR20050054778	申请日期	2005.06.24
申请人	SHIN-ETSU CHEMICAL CO., LTD.	发明人	WATANABE SATOSHI;KOBAYASHI TOMOHIRO;KAWAI YOSHIO;ISHIHARA TOSHINOBU
分类号	G03F7/42;C03C23/00	主分类号	G03F7/42
代理机构		代理人
主权项
地址

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