发明名称 METHOD OF AND APPARATUS FOR DETERMINING THE AMOUNT OF IMPURITY IN GAS
摘要 <p>Impurity is removed from gas, the resultant gas is introduced into a cell 15 , and the intensity of light transmitted through the cell 15 is measured as a reference. Gas containing impurity of which concentration is known, is introduced into the cell 15 , and the intensity of light transmitted through the cell 15 is measured with the temperature and pressure maintained at those used at the measurement of the reference light intensity. Then, the absorbance of the impurity is obtained according to the ratio of the two light intensity data obtained by the two measurements above-mentioned. The impurity absorbance thus obtained is stored, in a memory 20 a, as a function of an impurity concentration. Gas containing impurity of which concentration is unknown, is introduced into the cell 15 , and the intensity of light transmitted through the cell 15 is measured with the temperature and pressure maintained at those used at the measurements above-mentioned. The absorbance of the impurity is obtained according to the last-measured light intensity and the reference light intensity. The absorbance thus obtained is applied to the function, thereby to obtain the impurity concentration.</p>
申请公布号 KR20060050193(A) 申请公布日期 2006.05.19
申请号 KR20050064012 申请日期 2005.07.15
申请人 OTSUKA ELECTRONICS CO., LTD. 发明人 OKA KOICHI;NITTA SATOSHI
分类号 G01N21/03;G01N21/31;G01N21/3554 主分类号 G01N21/03
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