| 摘要 |
It is an object of the present invention to easily adjust the percentage of each component when mixing together several film formation materials, so as to prevent deviation among film formation areas. A film formation source (10) of a vacuum film formation apparatus (30) comprises: a plurality of material accommodating units (11A,11B) containing a plurality of film formation materials; a plurality of heating means (12A, 12B) for heating the film formation materials contained within the material accommodating units (11A, 11B); a plurality of discharge outlets (13A,13B) for discharging atom flows or molecule flows of film formation materials; apluralityof discharge passages (14 1 A, 14 2 A, 14 3 A, 14 1 B, 14 2 B, 14 3 B) for air-tightly communicating the material accommodating units (11A,11B) with discharge outlets (13A, 13B). Two groups of discharge outlets (13A, 13B) each for discharging an identical film formation material are arranged in one direction, in a manner such that two elongated discharge areas (S 1 A,S 1 B,S 2 A,S 2 B) formed by linearly connecting the outer edges of the discharge outlets (13A,13B) are at least partially overlapped with each other when viewed from overhead. |
