| 发明名称 |
PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION |
| 摘要 |
<p>A photosensitive composition containing a compound generating an organic acid having a specific structure, a compound for use in the photosensitive composition, and a pattern-forming method using the photosensitive composition.</p> |
| 申请公布号 |
KR20060051302(A) |
申请公布日期 |
2006.05.19 |
| 申请号 |
KR20050085857 |
申请日期 |
2005.09.14 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
WADA KENJI |
| 分类号 |
G03F7/004;G03F7/00 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
