EXPOSURE APPARATUS, DEVICE PRODUCING METHOD, AND EXPOSURE APPARATUS CONTROLLING METHOD

摘要

An exposure apparatus (EX) exposes a substrate (P) by projecting a pattern image on the substrate (P) through a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid feeding mechanism (10) for feeding the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the feeding of the liquid (1) when abnormality is detected. This constrains influence to devices and members in the periphery of the substrate caused by leakage of the liquid that forms a liquid immersion region, providing excellent exposure processing.