发明名称 Semiconductor device with superimposed poly-silicon plugs
摘要 A semiconductor device includes a first insulating layer; a first poly-silicon plug formed in the first insulating layer; a second insulating layer, formed on the first insulating layer; and a second poly-silicon plug that is formed in the second insulating layer. At least one of the first and second insulating layers is made from non-doped silicate glass. The first and second poly-silicon plugs are electrically coupled to each other in a thickness direction. Preferably, both the first and second insulating layers are made from non-doped silicate glass.
申请公布号 US2006103022(A1) 申请公布日期 2006.05.18
申请号 US20040989500 申请日期 2004.11.17
申请人 MANEKI JUNYA 发明人 MANEKI JUNYA
分类号 H01L23/48 主分类号 H01L23/48
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