发明名称 Organic thin film transistor array panel and manufacturing method thereof
摘要 A method of manufacturing a thin film transistor array panel is provided, the method includes: forming a gate line on a substrate; forming a gate insulating layer on the gate line; depositing an ITO layer at a temperature of about 20-35° C.; etching the ITO layer to form a data line and a drain electrode on the gate insulating layer; and forming an organic semiconductor on the data line, the drain electrode, and the gate insulating layer.
申请公布号 US2006102954(A1) 申请公布日期 2006.05.18
申请号 US20050236111 申请日期 2005.09.26
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 RYU MIN-SEONG;SEO JONG-HYUN;HONG MUN-PYO
分类号 H01L21/00;H01L21/84 主分类号 H01L21/00
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