发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <p>An illumination optical system (100) for illuminating a target surface (200) using light from a light source includes a modified illumination generator (130) for generating a modified illumination with a predetermined polarization state for the target surface, wherein the modified illumination generator includes a lambda / 4 phase plate unit (131) that includes a lambda / 4 phase plate for converting a circularly polarized light into a linearly polarized light in a predetermined direction, and a diffractive optical element unit (132) that is arranged in a substantially conjugate relationship with the target surface, and includes a diffractive optical element used for the lambda / 4 phase plate to generate a predetermined illumination intensity distribution when the diffractive optical element unit receives the linearly polarized light. <IMAGE></p>
申请公布号 KR20060048452(A) 申请公布日期 2006.05.18
申请号 KR20050053329 申请日期 2005.06.21
申请人 CANON KABUSHIKI KAISHA 发明人 TSUJI TOSHIHIKO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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