发明名称 DEVELOPER APPLICATOR
摘要 PROBLEM TO BE SOLVED: To provide a developer applicator which can improve the precision and surface uniformity of the resist pattern by making the developer of the same flow rate react on the resist film formed on the circuit board at the same time and in a short period. SOLUTION: The developer applicator 1 has a circuit board transfer means 4 to carry the circuit boards (resist boards) 11 having resist films 11b already formed on the boards 11a, a sprayer 21 having a nozzle 21a to jet and coat (spray) the developer 22 which reacts on the resist film 11b satisfying certain conditions, and a cleaner 31 to jet out pure water. The above sprayer can spray the developer 22 from the nozzle 21a to form a spray pattern 22a large enough to cover the whole resist forming surface, and the above nozzle 21a can spray the developer 22 evenly over the whole spray pattern 22a. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006126674(A) 申请公布日期 2006.05.18
申请号 JP20040317379 申请日期 2004.10.29
申请人 OPTREX CORP 发明人 NISHIHARA SHINJI
分类号 G03F7/30;G02F1/13;H01L21/027 主分类号 G03F7/30
代理机构 代理人
主权项
地址