发明名称 Static megasound cleaning system for cleaning substrates, has outer basin with four side walls with acoustic irradiation surfaces, where each surface is responsible for treatment of only small partial area of entire substrate surface
摘要 <p>The system has an outer basin with front and rear walls, and four side walls that are angled to each other. Each of the acoustic irradiation surfaces (A, B, C, D) is fitted to each side wall, where an acoustic irradiation of a substrate (1) to be treated takes place, from four different lateral directions, by using megasound generators (4). Each irradiation surface is responsible for treatment of only a small partial area of the entire substrate surface. An independent claim is also included for an operating software for a static megasound cleaning system.</p>
申请公布号 DE102004054658(B3) 申请公布日期 2006.05.18
申请号 DE20041054658 申请日期 2004.11.11
申请人 METRONICS SEMICONDUCTOR EQUIPMENT GMBH 发明人 MEYER, MARCO
分类号 B08B3/12;H01L21/302 主分类号 B08B3/12
代理机构 代理人
主权项
地址