发明名称 |
THERMOELECTRIC MATERIAL AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a thermoelectric material along with its manufacturing method comprising Mg<SB>2</SB>Si base thermoelectric semiconductor of excellent performance index, with improved safety in manufacturing process and reduced manufacturing cost when interested in a molten method and discharge plasma baking method under an atmospheric pressure. SOLUTION: A lump of Mg and Si is housed in the dissolve chamber 7 of a graphite vessel 1 comprising a buffer cavity 6 on the atmosphere side with Al and Zn composite-added as dopant element. With inert gas replaced in the buffer cavity 6, it is kept at a temperature range from the melting point of Mg<SB>2</SB>Si compound to the boiling point of Mg for a specified period, to generate a compound melt or alloy melt. The melt is cooled to generate an ingot. The Mg<SB>2</SB>Si material powder generated by crushing the ingot is baked by a discharge plasma baking method. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006128235(A) |
申请公布日期 |
2006.05.18 |
申请号 |
JP20040311740 |
申请日期 |
2004.10.27 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
LIU HUA-NAN;UENO HIDETOSHI;SAKAMOTO MITSURU;SATO TOMIO |
分类号 |
H01L35/14;B22F3/105;B22F9/04;C22C23/00;H01L35/34 |
主分类号 |
H01L35/14 |
代理机构 |
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