发明名称 THERMOELECTRIC MATERIAL AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a thermoelectric material along with its manufacturing method comprising Mg<SB>2</SB>Si base thermoelectric semiconductor of excellent performance index, with improved safety in manufacturing process and reduced manufacturing cost when interested in a molten method and discharge plasma baking method under an atmospheric pressure. SOLUTION: A lump of Mg and Si is housed in the dissolve chamber 7 of a graphite vessel 1 comprising a buffer cavity 6 on the atmosphere side with Al and Zn composite-added as dopant element. With inert gas replaced in the buffer cavity 6, it is kept at a temperature range from the melting point of Mg<SB>2</SB>Si compound to the boiling point of Mg for a specified period, to generate a compound melt or alloy melt. The melt is cooled to generate an ingot. The Mg<SB>2</SB>Si material powder generated by crushing the ingot is baked by a discharge plasma baking method. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006128235(A) 申请公布日期 2006.05.18
申请号 JP20040311740 申请日期 2004.10.27
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 LIU HUA-NAN;UENO HIDETOSHI;SAKAMOTO MITSURU;SATO TOMIO
分类号 H01L35/14;B22F3/105;B22F9/04;C22C23/00;H01L35/34 主分类号 H01L35/14
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