发明名称 POLISHING alpha-ALUMINA COMPOSITION, AND METHOD FOR PRODUCING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a polishingα-alumina composition useful as a polishing material having an excellent polishing rate, not leaving a polishing defect, and giving a good finish after the polishing, and to provide a method for producing the same. <P>SOLUTION: This polishingα-alumina composition is characterized in thatα-alumina used for a polishing composition in which theα-alumina is dispersed in water or an organic solvent as polishing particles has anα-crystal particle diameter of≤1μm, an oil absorption of≥50 mL/100 g, a 50% average particle diameter of 2 to 8μm, and a 90% particle diameter of≤20μm. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006124622(A) 申请公布日期 2006.05.18
申请号 JP20040318606 申请日期 2004.11.01
申请人 ISHIHARA CHEM CO LTD;WAKI TEKKU:KK 发明人 TAGO KAZUTO;TAKISHITA KATSUHISA;SHIJO MASAMITSU
分类号 C09K3/14;B24B37/00;C01F7/44 主分类号 C09K3/14
代理机构 代理人
主权项
地址