发明名称 THIN FILM PATTERN FORMING SUBSTRATE, MANUFACTURING METHOD OF DEVICE AND ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a thin film pattern forming substrate capable of forming a fine thin film pattern shaped in fine line accurately and stably, a manufacturing method of device and an electro-optical device, and an electronic apparatus. SOLUTION: In a substrate P, the thin film pattern is formed on the front surface. The substrate P is prepared by a liquid injecting portion A2 capable of injecting a functional liquid L, and a liquid flowing portion A1 arranged in connection so that the functional liquid L can flow. In these line widths of the liquid injecting portion A2 and the liquid flowing portion A1, they are formed in such a manner that the width d of the liquid injecting portion A2 is equal to or less than 2 times of the line width b of the liquid flowing portion A1. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006128530(A) 申请公布日期 2006.05.18
申请号 JP20040317558 申请日期 2004.11.01
申请人 SEIKO EPSON CORP 发明人 SAKAI MARI;HIRAI TOSHIMITSU
分类号 H05K3/10;B05D1/26;G02F1/1343;G09F9/00;G09F9/30 主分类号 H05K3/10
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