| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film deposition system having a substrate holder rotating with a rotary shaft as the center where variation is hard to occur in film thickness, and to provide a thin film deposition method. SOLUTION: In the thin film deposition system, a plurality of substrates are held to the outer circumferential face of a rotary drum 13, and further, the rotary shaft of the rotary drum 13 is provided with a rotary encoder 100. The rotary encoder 100 outputs information on the rotational position of the rotary drum 13 to a thin film deposition treatment controlling means 110. The thin film deposition treatment controlling means 110 performs the stop of a thin film deposition treatment at a rotational position coincident with the rotational position of the rotary drum 13 at the start of the thin film deposition treatment. Since thin film deposition treatments for the same times can be performed to all the substrates, the variation in film thickness is hard to occur between the substrates. COPYRIGHT: (C)2006,JPO&NCIPI
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