发明名称 |
Apparatus, method for supporting and/or thermally conditioning a substrate, a support table, and a chuck |
摘要 |
An apparatus including a support table for supporting a substrate is disclosed. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate during use without contacting the substrate when the substrate is supported by the support protrusions. Gas-containing heat exchanging gaps for exchanging heat with the substrate extend between the heat transfer protrusions and the substrate.
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申请公布号 |
US2006102849(A1) |
申请公布日期 |
2006.05.18 |
申请号 |
US20040970658 |
申请日期 |
2004.10.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MERTENS JEROEN JOHANNES S.M.;VAN MEER ASCHWIN LODEWIJK HENDRICUS J.;OTTENS JOOST J.;GOMPEL EDWIN V. |
分类号 |
G21K5/10 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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