发明名称 A METHOD OF MANUFACTURING A LOW METAL COLLOIDAL SILICA
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing high-purity colloidal silica at a low cost in a high efficiency of removal of metallic impurities such as Cu, Mn, Ni, Fe, Zn, and Cr contained in an aqueous alkali silicate solution as a raw material for colloidal silica. <P>SOLUTION: The method for producing the high-purity colloidal silica comprises a step of adding a nitrogen atom-containing or phosphorus atom-containing chelating agent to an aqueous colloidal silica solution to obtain an aqueous colloidal silica solution containing the chelating agent and an anion exchanger contact step of bringing the aqueous colloidal solution containing the chelating agent into contact with an anion exchanger. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 KR20060048901(A) 申请公布日期 2006.05.18
申请号 KR20050069221 申请日期 2005.07.29
申请人 NIPPON CHEMICAL INDUSTRIAL CO., LTD. 发明人 MAEJIMA KUNIAKI;MIYABE SHINSUKE;IZUMI MASAHIRO
分类号 C01B33/146;B24B37/00;C01B33/14;C01B33/141;C01B33/148 主分类号 C01B33/146
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