SPUTTERING TARGET FOR PRODUCTION OF METALLIC GLASS FILM AND PROCESS FOR PRODUCING THE SAME

摘要

A sputtering target for production of metallic glass film, characterized in that it has a structure obtained by sintering of an atomized powder of = 50 µm average particle diameter having a composition of three or more elements whose main component (component of greatest atomic %) is at least one metal element selected from among Pd, Zr, Fe, Co, Cu and Ni. It is intended to provide a sputtering target for production of metallic glass film that in place of the high-cost conventional bulk metallic glass produced by quenching of a molten metal, is free from the problems of defects and composition heterogeneity of produced metallic glass film, and that has a homogeneous structure and can be produced efficiently at low cost, and that reduces the occurrence of nodules and particles, and to provide a process for producing the same.