| 发明名称 |
POLISHING PAD HAVING A PRESSURE RELIEF CHANNEL |
| 摘要 |
The present invention provides a chemical mechanical polishing pad comprising a window formed in the polishing pad, the window having a void provided on a side thereof. The polishing pad further comprises a void-pressure relief channel provided in the polishing pad from the void to a periphery of the polishing pad. |
| 申请公布号 |
KR20060048382(A) |
申请公布日期 |
2006.05.18 |
| 申请号 |
KR20050051542 |
申请日期 |
2005.06.15 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
发明人 |
CRKVENAC T.T.;GAMBLE ROBERT T.;LAWHORN JASON M. |
| 分类号 |
B24B37/04;B24D7/12;B32B3/10;H01L21/304 |
主分类号 |
B24B37/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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