| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a pattern by which an alignment mark can be accurately detected to form a pattern even when high positional accuracy is required with a small-sized high performance device, in exposure techniques in a photolithography process of a semiconductor device and a printed wiring board or in a simple curing process of a photosensitive resin. <P>SOLUTION: In a process of forming a photosensitive resin pattern on a substrate, a portion except for a pattern forming portion is first exposed and developed to obtain an alignment mark, and then the pattern portion is exposed and developed. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
