| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus, a control system for controlling the lithography apparatus, a method for controlling the lithography apparatus, a substrate handler, a method for handling a plurality of substrates, a substrate-handling apparatus, and a method for manufacturing devices. <P>SOLUTION: The lithography apparatus includes a substrate table constructed, configured, and arranged so as to hold a plurality of substrates at each of a plurality of positions, where exposures can be made on the substrate, and a projection system constructed, configured, and arranged so as to project pattern-formed radiation beams onto the target portions of the plurality of substrates at positions where exposures can be made. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
