发明名称 MEASURING APPARATUS AND MEASUREMENT METHOD OF COMPLEX DIELECTRIC CONSTANT IN SAMPLE BY MEASURING REFLECTION OF LIGHT
摘要 <p><P>PROBLEM TO BE SOLVED: To realize an optical system for measuring the complex dielectric constant of a thin film on a substrate by measuring the reflection spectrum of a sample. <P>SOLUTION: The reflection spectrum of a parallel flat plate-shaped substrate has the constant and minimum reflection factor regardless of an incident angle at the bottom frequency of a fringe, but the reflection factor increases and approaches 1 by increasing the incident angle at the peripheral frequency. When a thin film is placed on the substrate and the thickness is increased, the bottom frequency of the fringe is shifted to a low-frequency side. The spectrum (relative reflection spectrum) of the ratio of the reflection spectrum in a system comprising a substrate and a thin film to the reflection spectrum of only the substrate shows a structure in which the minimum and maximum values are adjacent due to the three effects, thus obtaining the complex dielectric constant of the thin film by analyzing the relative reflection spectrum. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006125888(A) 申请公布日期 2006.05.18
申请号 JP20040311458 申请日期 2004.10.26
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 KAWATE ETSUO
分类号 G01N21/35;G01N21/3563;G01N21/3581 主分类号 G01N21/35
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