发明名称 SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a scanning electron microscope and a sample observation method capable of obtaining a stable scanning image by sufficiently reducing the influence of charge-up of a sample surface. SOLUTION: The scanning electron microscope 1 is provided with electron guns 3A, 3B, and electron beam B<SB>1</SB>emitted from the electron gun 3A has a higher energy than the electron beam B<SB>2</SB>emitted from the electron gun 3B. The electron beams B1, B2 emitted from the electron guns 3A, 3B are bent by a beam bending mechanism 8 so that their irradiation direction toward a substrate 2 coincide with each other, further, made to pass through an alignment coil 9 and an objective lens 10, scanned by a scanning coil 11, and irradiated on the same position of the substrate 2. At this time, secondary electron emitted from the substrate 2 is detected by a detector 15, a detection signal of which 15 is sent to an image processing part 16, and a scanning image of the substrate 2 is produced by the image processing part 16. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006127903(A) 申请公布日期 2006.05.18
申请号 JP20040314394 申请日期 2004.10.28
申请人 APPLIED MATERIALS INC 发明人 TSUNEOKA MASATOSHI
分类号 H01J37/28 主分类号 H01J37/28
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