发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE EQUIPMENT AND EXPOSURE METHOD
摘要 <p>A projection optical system having excellent imaging performance by correcting an aberration relating to image height and an aberration relating to numerical apertures in a balanced manner, while ensuring a large effective image side numerical apertures by providing a liquid in a light path between an image plane and the projection optical system. The projection optical system which forms an image of a first plane (R) on a second plane (W). The light path, which is between an optical member (L22:Lb) positioned closest to the second plane side among optical members having refractive power in the projection optical system and the second plane, is filled with the prescribed liquid. Conditions of 0.02&lt;NA×WD/FA&lt;0.08 are satisfied, where, NA is numerical apertures on the second plane side of the projection optical system, WD is an interval along an optical axis between an optical member positioned closest to the first plane side in the projection optical system and the first plane, and FA is the maximum value of the effective diameter of all the optical planes in the projection optical system.</p>
申请公布号 WO2006051689(A1) 申请公布日期 2006.05.18
申请号 WO2005JP19689 申请日期 2005.10.26
申请人 NIKON CORPORATION;FUJISHIMA, YOUHEI 发明人 FUJISHIMA, YOUHEI
分类号 G02B13/24;G02B13/18;G03F7/20;H01L21/027 主分类号 G02B13/24
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