发明名称 POLIERVORRICHTUNG UND POLIERKISSEN
摘要 A polishing pad ( 10 ) has an upper-layer pad ( 11 ) having a hole ( 11 a) defined therein, a light-transmittable window ( 41 ) disposed in the hole ( 11 a) for allowing light to pass therethrough, and a lower-layer pad ( 12 ) disposed below the upper-layer pad ( 11 ) and having a light passage hole ( 12 a) defined therein which has substantially the same diameter as the hole ( 11 a) in the upper-layer pad ( 11 ). A transparent film ( 13 ) with an adhesive agent applied to upper and lower surfaces thereof is interposed between the upper-layer pad ( 11 ) and the lower-layer pad ( 12 ). The hole ( 11 a) defined in the upper-layer pad ( 11 ) and the light passage hole ( 12 a) defined in the lower-layer pad ( 12 ) have substantially the same size as each other.
申请公布号 DE60210275(D1) 申请公布日期 2006.05.18
申请号 DE2002610275 申请日期 2002.06.12
申请人 EBARA CORP. 发明人 OHTA, SHINRO;SHIMIZU, KAZUO
分类号 B24B27/04;B24B37/00;B24B37/013;B24B37/04;B24B37/20;B24B37/22;B24B37/24;B24D7/12;H01L21/304;H01L21/306 主分类号 B24B27/04
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