| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which can change the state of the moving limit of a substrate treatment room to a housing even if power is not supplied to the substrate treatment apparatus. SOLUTION: The sliding of the substrate treatment room 20a contained in the housing of the substrate treatment apparatus is limited by a slide stopper mechanism having a cylinder (air cylinder) 221a fixed to the rear surface of the substrate treatment room 20a, and stopper blocks 225, 226 fixed to a shelf plate 112a. The supply of drive air to the stopper block mechanism is limited by a control circuit (air circuit) configured by including a control circuit body. COPYRIGHT: (C)2006,JPO&NCIPI
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