发明名称 GAS TREATMENT APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gas treatment apparatus, having a smaller and easier constituent and also capable of carrying out a stable operation by preventing or lowering a bad influence due to generation of water droplets. <P>SOLUTION: The gas treatment apparatus 10 has an electrical discharging part 12 equipped with an electrode for forming, by discharging, an active plasma to carry out a cleaning treatment of(for) a gas X to be treated, a discharging power source 13 for supplying (an) electric power to the electrical discharging part 12, and a heating means 15 for heating the electrical discharging part 12 so that a surface temperature of the electrical discharging part 12 contacting to the gas X to be treated is equal to or more than a temperature of the gas X to be treated in the electrical discharging part 12. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006122849(A) 申请公布日期 2006.05.18
申请号 JP20040317261 申请日期 2004.10.29
申请人 TOSHIBA CORP 发明人 HAYASHI KAZUO;NODA ETSUO;YASUI SUKEYUKI;HASHIMOTO KIYOSHI;ARAKI KUNIYUKI
分类号 B01J19/08;B01D53/56;B01D53/74;F01N3/02;F01N3/08;F01N3/24;F01N3/28;F01N9/00 主分类号 B01J19/08
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